Karl Suss MJB 3 Mask Aligner
The MJB 3 is designed for high resolution photolithography in a laboratory or pilot plant production. It offers flexibility in handling of irregularly shaped substrates of differing thickness as well as standard sized substrates up to 3” diameter.
Capabilities
- Mask size: 2.5 inch 3 inch and 4 inch
- Substrate sizes: pieces to 75 mm
- Range of alignment: X, Y ± 10mm and Theta ± 10°
- Substrate movement is performed with high precision micrometers for X, Y, and Theta axis resolution of 0.1 μm
- Alignment accuracy: 0.1μm for top side alignment (with 20x objectives)
- Exposure modes: soft contact, hard contact, and vacuum contact
- Print resolution:
- Soft contact: 1.0 – 2.0 μm
- Hard contact: 0.8 – 1.5 μm
- Vacuum contact: 0.6 μm
- 350 mercury arc lap with a UV filters for 365 nm and 405 nm wavelength
Contact
Hafiz Muhammad Noman Amin, Lab Engineer | muhammad.noman@lums.edu.pk
Associated Faculty
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| Dr. Nauman Zafar Butt nauman.butt@lums.edu.pk |
Dr. Habib Ur Rehman habib.rehman@lums.edu.pk |
Dr. Ata Ulhaq ata.haq@lums.edu.pk |